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Semiconductor Analysis
Semiconductor Sample Preparation for TEM and STEM
Sample preparation for TEM and STEM imaging of semiconductor devices.
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Novel semiconductor device fabrication requires highly accurate imaging and failure analysis to produce improved and optimized fabrication workflows. This means advanced (scanning) transmission electron microscopy (TEM and STEM, or (S)TEM) tools have become a critical component in all leading-edge wafer-fabrication processes.
However, TEM imaging and analysis are highly dependent on the quality of the sample. As a result, sample preparation is a crucial task in fabrication facilities and failure analysis labs. The problem is that conventional methods for ultra-thin (S)TEM sample preparation are challenging and time-consuming, requiring hours, if not days of manual operation by experienced users. The wide range of materials now used in device manufacturing, coupled with the need for site-specific information, only further complicates this process.
Thermo Fisher Scientific offers rapid, accurate, and robust sample preparation tools for (S)TEM imaging on advanced semiconductor designs. Our entire suite of sample preparation instruments allows you to reach atomic scale data faster, easier, and with minimal cost-per-sample. Additionally, Thermo Scientific AutoTEM 5 Software supports fully automated in-situ TEM sample preparation using DualBeam systems. This gives users (of any experience level) the ability to obtain fast, reliable, and repeatable results. Click through to the appropriate product pages below for more information.
Sample prepared with AutoTEM 5 Software, which enables 1-click bulk sample preparation.
TEM sample preparation workflow examples
In-situ TEM sample preparation; the sample is ready for final thinning on the grid.
In-situ TEM sample preparation; the sample is ready for final thinning on the grid.
Automated ex-situ TEM sample preparation; the sample is ready for lift out.
Automated ex-situ TEM sample preparation; the sample is ready for lift out.
DualBeam user interface, showing relevant views for the precise placement of the TEM sample using high-resolution imaging.
In-situ TEM sample preparation; the sample is ready for final thinning on the grid.
In-situ TEM sample preparation; the sample is ready for final thinning on the grid.
Automated ex-situ TEM sample preparation; the sample is ready for lift out.
Automated ex-situ TEM sample preparation; the sample is ready for lift out.
DualBeam user interface, showing relevant views for the precise placement of the TEM sample using high-resolution imaging.
Desarrollo y trazabilidad de semiconductores
Microscopía electrónica avanzada, haz de iones enfocado y técnicas analíticas asociadas para identificar soluciones viables y métodos de diseño para la fabricación de dispositivos semiconductores de alto rendimiento.
Análisis de fallos de semiconductores
Las estructuras de dispositivos semiconductores cada vez más complejas dan lugar a que existan más ubicaciones en las que se oculten los defectos inducidos por fallos. Nuestros flujos de trabajo de última generación le ayudarán a localizar y caracterizar los sutiles problemas eléctricos que afectan a la producción, al rendimiento y a la fiabilidad.
Caracterización física y química
La demanda continua de los consumidores impulsa la creación de dispositivos electrónicos más pequeños, más rápidos y más baratos. Su producción se basa en instrumentos y flujos de trabajo de alta productividad que generan imágenes, analizan y caracterizan una amplia gama de semiconductores y dispositivos de visualización.
Metrología y rampa de producción
Ofrecemos capacidades analíticas avanzadas para el análisis de defectos, metrología y control de procesos, diseñadas para ayudar a aumentar la productividad y mejorar el rendimiento en una amplia gama de aplicaciones y dispositivos semiconductores.
Materiales semiconductores y caracterización de dispositivos
A medida que los dispositivos semiconductores se reducen y se vuelven más complejos, se necesitan nuevos diseños y estructuras. Los flujos de trabajo de análisis en 3D de alta productividad pueden reducir el tiempo de desarrollo de dispositivos, maximizar el rendimiento y garantizar que los dispositivos satisfacen las necesidades futuras del sector.
Style Sheet for Komodo Tabs
Style Sheet to change H2 style to p with em-h2-header class
Hoja de estilo para tarjetas originales instrumentos
