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Semiconductor Analysis
FIB Circuit Edit
FIB circuit edit and semiconductor prototyping.
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FIB circuit edit and rapid prototyping
Time to market is a critical factor in the success of semiconductor devices. Manufacturing timelines are long and difficult to manage, so it is important that early production runs provide functional devices. Late discovery of design issues limiting device performance at final test can lead to months of delays in product introduction timelines while new mask sets are created, and new devices are manufactured.
Circuit edit systems provide a solution to test and validate design changes, optimize performance, prototype, and scale functional devices for internal and external customer’s development, validation, and qualification. Circuit edit systems utilize high-resolution focused ion beams (FIBs) and advaced chemistries to perform “nano-surgery” on semi-conductor devices, cutting and creating connections within the device to correct design issues and return functioning products. These working devices keep projects on track without the costs and delays of new mask sets.
Circuit edit systems
With the Thermo Scientific Centrios and Centrios HX Circuit Edit Systems, you can manage program costs, avoid schedule delays, and accelerate time-to-market. The Centrios HX System is designed to meet the circuit editing needs of today’s most advanced semiconductor devices. The Centrios System provides circuit edit capability suitable for a wide range of applications where the required circuit edit performance can be delivered with an improved cost of ownership. Both systems are optimized for the modern, competitive technology world.
Introducing the Thermo Scientific Centrios HX Circuit Edit System
Enable working device prototypes and speed up product development cycles with the Centrios HX Circut Edit System.
Circuit edit and semiconductor prototyping workflow
High-resolution focused ion beam milling opens a low-level metal layer with precision and control.
Our instrumentation offers superior contrast with a high signal-to-noise ratio, even at low-kV, revealing active areas of interest while minimizing damage.
The innovative Dual MultiChem Gas Delivery System enables repeatable, precise, and uniform process control.
Planar large-area delayering with unique chemistry performed using the Dual MultiChem Gas Delivery System.
Fundamentals of Circuit Edit eBook
While circuit editing is a well-established technique, it can be especially difficult for those who are new to it. To help you get started, we asked our circuit edit customers what they wish they had known when they started doing FIB circuit edit and collected their feedback, as well as input from our team of experts, in our new eBook: Fundamentals of Circuit Edit. The eBook includes:
- A definition of circuit edit
- An overview of focused ion beams
- Circuit edit tips from experienced practitioners
- Descriptions of key circuit edit tools and solutions
High-resolution focused ion beam milling opens a low-level metal layer with precision and control.
Our instrumentation offers superior contrast with a high signal-to-noise ratio, even at low-kV, revealing active areas of interest while minimizing damage.
The innovative Dual MultiChem Gas Delivery System enables repeatable, precise, and uniform process control.
Planar large-area delayering with unique chemistry performed using the Dual MultiChem Gas Delivery System.
Fundamentals of Circuit Edit eBook
While circuit editing is a well-established technique, it can be especially difficult for those who are new to it. To help you get started, we asked our circuit edit customers what they wish they had known when they started doing FIB circuit edit and collected their feedback, as well as input from our team of experts, in our new eBook: Fundamentals of Circuit Edit. The eBook includes:
- A definition of circuit edit
- An overview of focused ion beams
- Circuit edit tips from experienced practitioners
- Descriptions of key circuit edit tools and solutions
Pathfinding und Entwicklung von Halbleitern
Fortschrittliche Elektronenmikroskopie, fokussierter Ionenstrahl und zugehörige Analyseverfahren zur Identifizierung umsetzbarer Lösungen und Designmethoden für die Herstellung von leistungsstarken Halbleiterbauelementen.
Ausbeutesteigerung und Metrologie
Wir bieten fortschrittliche Analysemöglichkeiten für die Fehleranalyse, Metrologie und Prozesskontrolle, die die Produktivität erhöhen und die Ausbeute bei zahlreichen Halbleiteranwendungen und Halbleiterbauelementen verbessern.
Analyse von Leistungshalbleitern
Leistungshalbleiter stellen besondere Herausforderungen für die Lokalisierung von Fehlern dar, vor allem aufgrund der Architektur und des Aufbaus von Leistungshalbleitern. Unsere Geräte und Arbeitsabläufe für die Analyse von Leistungshalbleitern ermöglichen unter Betriebsbedingungen eine schnelle Bestimmung des Fehlerorts sowie eine präzise Hochdurchsatzanalyse zur Charakterisierung von Materialien, Schnittstellen und Bauelementstrukturen.
Charakterisierung von Halbleitermaterialien und Halbleiterbauelementen
Da Halbleiterbauelemente immer kleiner und komplexer werden, werden neue Designs und Strukturen benötigt. Arbeitsabläufe für hochproduktive 3D-Analysen können die Entwicklungszeit von Bauelementen verkürzen, die Ausbeute maximieren und sicherstellen, dass Bauelemente die zukünftigen Anforderungen der Branche erfüllen.
Style Sheet for Komodo Tabs
Style Sheet to change H2 style to p with em-h2-header class
Formatvorlage für das Original der Instrumentenkarten
