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View additional product information for Dionex™ Integrion™ HPIC™ System - FAQs (22153-60306, 22153-60305)
15 product FAQs found
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By increasing pressure tolerance up to 6000 psi, smaller particle size columns such as 4 µm particle-size columns can be used to achieve shorter run times. This allows the system to provide increased throughput and productivity without sacrificing resolution or data quality. Automated eluent generation provides time savings by eliminating human errors associated with manual eluent preparation.
By increasing pressure tolerance up to 6000 psi, smaller particle size columns such as 4 µm particle-size columns can be used to achieve shorter run times. This allows the system to provide increased throughput and productivity without sacrificing resolution or data quality. Automated eluent generation provides time savings by eliminating human errors associated with manual eluent preparation.
The system's Reagent-Free IC (RFIC) capabilities extend the lifetime of pump pistons and seals because the pump delivers only water and eluents are generated on-line.
The system features simple-to-install IC PEEK Viper Fittings that require no extra training or tools and a logical, flow-based plumbing layout that makes it easy to understand and operate.
The system is designed for a variety of applications, including environmental water testing, food and beverage analysis (particularly carbohydrates/sugars), biofuels analysis, and pharmaceutical testing.
Automated eluent generation eliminates human errors associated with manual eluent preparation, improves analytical consistency and reproducibility, reduces the need for calibration, and enables gradient separations with an isocratic pump.
Automated eluent generation ensures consistent performance across different days, labs, and operators. The eluent generator electrolytically produces high-purity eluents on-line, delivering eluent concentrations from 0.1-100 mM for hydroxide, carbonate, bicarbonate, or methanesulfonic acid (MSA) at typical application flow rates and pressures up to 5000 psi.
You can configure the system with either a conductivity detector (CD) or an electrochemical detector (ED). You can also remove the internal detector and connect to an external one, such as a mass spectrometer, if needed.
The system features a variable flow, serial-piston pump design with pressure tolerance up to 6000 psi and linear flow rates from 0.001 to 10 mL/min. The forced-air column oven provides precise temperature control from 5 °C above ambient to 80 °C.
Like other Thermo Scientific Dionex HPIC systems, the Dionex Integrion HPIC System can operate continuously at up to 5000 psi when configured as an Reagent-Free IC (RFIC) technology. The integrated design of the system delivers high performance in a small footprint, saving critical bench space while ensuring convenient access to all components. The detector compartment provides a thermally regulated environment for reproducible, sensitive detection and can house either a conductivity detector (CD) or an electrochemical detector (ED).
HPIC stands for high-pressure ion chromatography. This capability enables the use of smaller-particle-size 4 µm columns, which provide faster flow rates without sacrificing resolution. HPIC results in shorter run times and increased laboratory throughput while maintaining data quality.
The Thermo Scientific Dionex Integrion HPIC System is a high-pressure ion chromatography (IC) instrument designed for reliable, consistent analysis. It features a logical flow-based plumbing layout, automated eluent generation capabilities, and integration with a conductivity or electrochemical detector. You can easily switch between these two detectors or connect to an external one, such as a mass spectrometer, if needed.
The Consumables Device Monitor can be turned off in the Chromeleon Instrument Configuration Manager.
No special consumables need to be ordered. From February 2016, all consumables will have the memory tag installed and include an "RFID Ready" or "Device Monitoring Enabled" message on the label.