Thermo Scientific™

Helios 5 PXL PFIB Wafer DualBeam

Catalog number: HELIOS-5-PFIB-PXL
Thermo Scientific™

Helios 5 PXL PFIB Wafer DualBeam

Catalog number: HELIOS-5-PFIB-PXL
PFIB SEM for in-line metrology and process monitoring of advanced 3D NAND and DRAM devices.
 
Catalog Number
HELIOS-5-PFIB-PXL
Unit Size
Each
Price (USD)
Full specifications
DescriptionPlasma FIB and SEM system for in-line metrology, process monitoring, and large-area PFA and TEM prep
TypePFIB Wafer DualBeam
Resolution0.9 nm @ 15 kV
1.0 nm @ 1 kV
Unit SizeEach
Showing 1 of 1
Catalog NumberSpecificationsUnit SizePrice (USD)
HELIOS-5-PFIB-PXLFull specifications
EachRequest A Quote
DescriptionPlasma FIB and SEM system for in-line metrology, process monitoring, and large-area PFA and TEM prep
TypePFIB Wafer DualBeam
Resolution0.9 nm @ 15 kV
1.0 nm @ 1 kV
Unit SizeEach
Showing 1 of 1
  • The Thermo Scientific Helios 5 PXL Wafer DualBeam is a plasma focused ion beam scanning electron microscope (PFIB SEM) that redefines the standard for high-aspect-ratio through-stack metrology and structural verification. It features high-performance in-line metrology and process monitoring to quickly provide critical insights for process development and manufacturing engineers.
  • Designed to meet the in-line metrology and process control requirements of the fab, the Helios 5 PXL Wafer DualBeam significantly reduces time to data and enables the wafer to be returned to the line without being pulled and scrapped.
  • The Helios 5 PXL Wafer DualBeam is compatible with semiconductor factory automation, facilitating operator-free recipe-driven operations. This automation can support the high-throughput requirements of fab metrology and process monitoring – even on the most challenging structures.

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