Helios 5 CX DualBeam for Materials Science
Helios 5 CX DualBeam for Materials Science
Helios 5 CX DualBeam for Materials Science
Helios 5 CX DualBeam for Materials Science
Helios 5 CX DualBeam for Materials Science
Thermo Scientific™

Helios 5 CX DualBeam for Materials Science

The Thermo Scientific™ Helios™ 5 CX DualBeam is part of the fifth generation of the industry-leading Helios DualBeam family.
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Catalog number HELIOS5CX
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The Thermo Scientific™ Helios™ 5 CX DualBeam is part of the fifth generation of the industry-leading Helios DualBeam family. It is carefully designed to meet the needs of scientists and engineers, combining the innovative Elstar™ electron column for ultra high-resolution imaging and the highest materials contrast with the superior Thermo Scientific™ Tomahawk HT Focused Ion Beam (FIB) Column for the fastest, easiest and most precise high-quality sample preparation. In addition to the most advanced electron and ion optics, the Helios 5 CX DualBeam incorporates a suite of state of-the-art technologies that enables simple and consistent high resolution S/TEM and Atom Probe Tomography (APT) sample preparation, as well as the highest-quality subsurface and 3D characterization, even on the most challenging samples.

Key Benefits:

  • Highest-quality, site-specific, sample preparation for TEM and APT using the new high throughput Tomahawk HT Ion Column
  • Fastest and easiest, fully automated, unattended, multisite in situ and ex situ TEM sample preparation and cross sectioning using optional AutoTEM 5 Software
  • Shortest time to nanoscale information for users with any experience level using best-in-class Elstar Electron Column featuring SmartAlign and FLASH technologies
  • The most complete sample information with sharp, refined and charge-free contrast obtained from up to six integrated in-column and below-the-lens detectors
  • The highest-quality, multi-modal subsurface and 3D information with the most precise targeting of the region of interest using optional Auto Slice & View 4 (AS&V4) Software
  • Fast, accurate and precise milling and deposition of complex structures with critical dimensions of less than 10 nm
  • Easiest sample handling and navigation with high flexibility 110 mm stage, multi-purpose sample holder and Nav-Cam+
  • Artifact-free imaging based on integrated sample cleanliness management and dedicated imaging modes such as DCFI and SmartScan Modes
Specifications
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