Helios 5 Hydra CX DualBeam
Helios 5 Hydra CX DualBeam
Thermo Scientific™

Helios 5 Hydra CX DualBeam

The Thermo Scientific™ Helios 5 Hydra CX DualBeam is part of the fourth generation of the industry-leading Helios DualBeam family. It combines the new, innovative multiple ion species PFIB column with the monochromated Thermo Scientific Elstar SEM Column to provide the most advanced focused ion- and electron-beam performance.
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Catalog number HYDRACX
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The Thermo Scientific™ Helios 5 Hydra CX DualBeam is part of the fourth generation of the industry-leading Helios DualBeam family. It combines the new, innovative multiple ion species PFIB column with the monochromated Thermo Scientific Elstar SEM Column to provide the most advanced focused ion- and electron-beam performance.
Key Benefits
  • Largest application space with unique ion source delivering four fast, switchable ion species: Xe, Ar, O, N
  • Highest quality Ga+ free TEM and APT sample preparation with Xe, O or Ar thanks to the new PFIB column enabling 500 V final polishing and delivering superior performance at all operating conditions
  • Fastest and easiest, automated, multisite in situ and ex situ TEM sample preparation and cross-sectioning using optional AutoTEM 5 Software
  • Highest throughput and quality statistically relevant 3D characterization, cross-sectioning and micromachining using next-generation 2.5 μA Plasma FIB column
  • Access high-quality, multi-modal subsurface and 3D information with precise targeting of the region of interest using optional Auto Slice & View 4 (AS&V4) Software
  • Shortest time to nanoscale information for users with any experience level with SmartAlign and FLASH technologies
  • Reveal the finest details using the best-in-class Elstar Electron Column with high-current UC+ monochromator technology, enabling sub-nanometer performance at low energies
  • The most complete sample information with sharp, refined and charge-free contrast obtained from up to six integrated in-column and below-the-lens detectors
  • Most advanced capabilities for electron and ion beaminduced deposition and etching on DualBeam systems with optional MultiChem or GIS Gas Delivery Systems
  • Precise sample navigation tailored to individual application needs thanks to the high stability and accuracy of the 150 mm Piezo stage and optional in-chamber Nav-Cam Camera
  • Artifact-free imaging based on integrated sample cleanliness management and dedicated imaging modes such as SmartScan and DCFI Modes
Specifications
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