Silicon tetraacetate is used in the preparation of silicon dioxide thin films by a direct photochemical vapor deposition method. It serves as a precursor to prepare silicon complexes with monofunctional bidentate Schiff bases. It is also used as an alternative to silicon hydride and alkoxide for low-temperature silicon dioxide production. Further, it reacts with ethanol in the absence of water to get silica gel and ethyl acetate. In addition, it is employed as a sol-gel precursor.

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