Shop All Focused Ion Beam Electron Microscopes (FIB)

OptiFIB Taipan for Semiconductors Thermo Scientific™

Circuit edit technology provides rapid prototyping of small design corrections at various points in the IC manufacturing process: after first silicon debug; for performance enhancements during yield ramp; to create a small number of functioning chips for beta developers; and to resolve reliability issues. Circuit edit engineers mill the chip to the site of the suspected defect, and then remove or deposit conductors or insulators in precise geometries-allowing IC manufacturers to validate design changes without re-spinning masks and processing additional wafers.

To meet the stringent circuit edit requirements of the 10nm node, Thermo Scientific™ OptiFIB Taipan focused ion beam system was engineered to meet the challenges of advanced designs and processes. A new coaxial ion-photon column, electronics, chamber and stage enable a highly controlled beam profile and current, accurate navigation and ion beam placement, and reliable end-pointing. An updated chemical delivery system provides industry-leading etch and deposition chemistries.

Helios™ G4 PFIB CXe DualBeam™ for Semiconductors Thermo Scientific™

The Helios G4 PFIB CXe DualBeam System enables you to:

  • Reveal the finest details using best-in-class Elstar™ SEM Electron Column with high-current UC+ monochromator technology, enabling nanometer SEM image resolution and surface sensitivity.
  • Perform the highest throughput and quality relevant 3D characterization, cross-sectioning, and micromachining using the next-generation 2.5μA Xenon Plasma FIB (PFIB 2.0) Column.
  • Prepare high-quality Ga+ free TEM samples thanks to the PFIB 2.0 Column’s superior performance at all operating conditions and guided TEM sample preparation workflow.
  • Achieve high-productivity, curtain-free preparation of large area cross-sections and highest quality TEM lamella with Auto Rocking Mill.
  • Navigate precisely on your sample, tailored to individual application needs thanks to the highly flexible 110mm stage and optional in-chamber NavCam.
     

Helios™ G4 PFIB UXe DualBeam™ FIB/SEM for Materials Science Thermo Scientific™

Thermo Scientific™ Helios™ G4 PFIB delivers unmatched capabilities for large volume 3D characterization, Ga+free sample preparation and precise micromachining. Helios G4 PFIB UXe is part of the fourth generation of the industry-leading Helios DualBeam family. It combines the new PFIB 2.0 column and the Thermo Scientific™ Monochromated Elstar™ SEM column to deliver the most advanced focused ion- and electron beam performance. Intuitive software and an unprecedented level of automation and ease-of-use provide observation and analysis of relevant subsurface volumes by scientists and engineers.

Helios™ G4 PFIB UXe DualBeam™ for Semiconductors Thermo Scientific™

The Thermo Scientific™ Helios™ G4 PFIB UXe DualBeam™ System provides unique capabilities to enable damage-free delayering of semiconductor devices and advanced failure analysis of 3D packages, in addition to a wide range of other large area FIB processing applications.

Helios™ 5 Laser PFIB Thermo Scientific™

Fastest high-quality sub-surface and 3D characterization at millimeter scale with nanometers resolution. The Thermo Scientific™ Helios™ 5 Laser PFIB delivers unmatched capabilities for extreme large-volume 3D analysis, Ga-free sample preparation, and precise micromachining. Featuring an innovative, fully integrated femtosecond laser, it offers the fastest material removal rate with the highest cut face quality.

Helios™ G4 PFIB HXe DualBeam™ for Semiconductors Thermo Scientific™

The Thermo Scientific™ Helios™ G4 PFIB HXe DualBeam™ System provides unique capabilities to enable damage-free delayering of 10nm semiconductor devices and advanced failure analysis of 3D packages, in addition to a wide range of other large area FIB processing applications.

Helios™ G4 PFIB CXe DualBeam™ FIB/SEM for Materials Science Thermo Scientific™

Thermo Scientific™ Helios™ G4 PFIB delivers unmatched capabilities for large volume 3D characterization, Ga+free sample preparation and precise micromachining. Helios G4 PFIB CXe is part of the fourth generation of the industry-leading Helios DualBeam family. It combines the new PFIB 2.0 column and the Thermo Scientific™ Monochromated Elstar™ SEM column to deliver the most advanced focused ion- and electron beam performance. Intuitive software and an unprecedented level of automation and ease-of-use provide observation and analysis of relevant subsurface volumes by scientists and engineers.
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