Focused Ion Beam Electron Microscopes

Focused Ion Beam Electron Microscopes

Focused ion beam, or FIB, electron microscopes, use ion beams for high-resolution imaging of samples. Products can be used in laboratory, industrial, and other settings for various applications.
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1-8 of 8 Products

Helios™ G4 PFIB UXe DualBeam™ FIB/SEM for Materials Science Thermo Scientific™

Thermo Scientific™ Helios™ G4 PFIB delivers unmatched capabilities for large volume 3D characterization, Ga+free sample preparation and precise micromachining. Helios G4 PFIB UXe is part of the fourth generation of the industry-leading Helios DualBeam family. It combines the new PFIB 2.

Helios 5 EXL DualBeam Thermo Scientific™

TEM sample preparation with the Helios 5 EXL DualBeam FIB SEM is automated and wafer-based, enabling the analysis of advanced 5 nm semiconductor nodes and more.

Helios™ G4 PFIB CXe DualBeam™ FIB/SEM for Materials Science Thermo Scientific™

Thermo Scientific™ Helios™ G4 PFIB delivers unmatched capabilities for large volume 3D characterization, Ga+free sample preparation and precise micromachining. Helios G4 PFIB CXe is part of the fourth generation of the industry-leading Helios DualBeam family. It combines the new PFIB 2.

Helios™ 5 Laser PFIB Thermo Scientific™

Fastest high-quality sub-surface and 3D characterization at millimeter scale with nanometers resolution. The Thermo Scientific™ Helios™ 5 Laser PFIB delivers unmatched capabilities for extreme large-volume 3D analysis, Ga-free sample preparation, and precise micromachining.

CleanMill Broad Ion Beam System Thermo Scientific™

High-quality observation and characterization of materials often require an artifact-free surface, which can be difficult to achieve with traditional polishing techniques like grinding or mechanical polishing.

Helios™ G4 PFIB HXe DualBeam™ for Semiconductors Thermo Scientific™

The Thermo Scientific™ Helios™ G4 PFIB HXe DualBeam™ System provides unique capabilities to enable damage-free delayering of 10nm semiconductor devices and advanced failure analysis of 3D packages, in addition to a wide range of other large area FIB processing applications.

Helios™ G4 PFIB CXe DualBeam™ for Semiconductors Thermo Scientific™

The Helios G4 PFIB CXe DualBeam System enables you to: Reveal the finest details using best-in-class Elstar™ SEM Electron Column with high-current UC+ monochromator technology, enabling nanometer SEM image resolution and surface sensitivity.

Helios™ G4 PFIB UXe DualBeam™ for Semiconductors Thermo Scientific™

The Thermo Scientific™ Helios™ G4 PFIB UXe DualBeam™ System provides unique capabilities to enable damage-free delayering of semiconductor devices and advanced failure analysis of 3D packages, in addition to a wide range of other large area FIB processing applications.
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