Inductively coupled plasma optical emission spectroscopy (ICP-OES) is the technique of choice for many different applications, including those in the environmental, metallurgical, geological, petrochemical, pharmaceutical, materials, and food safety arenas.
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Perform rapid elemental analysis of solid metallic samples with optical emission spectrometry using Arc/Spark excitation. This technique meets the most demanding analysis needs of the metals industry from production control to R&D, from incoming material inspection to scrap sorting.
Learn More Petrochemical Analysis by ICP-OES
The petrochemical industry widely uses Inductively Coupled Plasma-Optical Emission Spectroscopy (ICP-OES) for the analysis of trace elements during extraction and refining of crude oil, where trace elements are identified and measured in drilling mud compounds, produced waters, crude oil, and in the...
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An industry-standard analytical solution for metallurgical applications, optical emission spectrometry (OES) is well-established for the analysis of a large range of metals and alloys (from Ag to Zn). It is the ideal technology for process and quality control in metal production and is routinely...
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Inductively coupled plasma optical emission spectroscopy (ICP-OES) is an elemental analysis technique that derives its analytical data from the emission spectra of elements excited within a high-temperature plasma.
Learn More ICP-OES Sample Preparation
A variety of sample types can be analyzed by inductively coupled plasma optical emission spectroscopy (ICP-OES), including aqueous and organic liquid and solid samples. These have to be brought into a state that the ICP and the instrument as a whole can process for elemental analysis.
Learn More Trace Elemental Analysis (TEA) Information
Chemical elements constitute all of the ordinary matter in the universe. Of the 118 elements that have been identified, 94 are found naturally on Earth, having either stable or unstable isotopes. Because all matter differs in its elemental composition, it also differs in its chemical properties.
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Enhance your lab efficiency and productivity with comprehensive software solutions for the complete analysis of a wide range of materials. Whether you have an optical emission spectrometry (OES) system or an X-ray fluorescence (XRF) system, we offer solutions to perform high-quality analysis easily...
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What are elemental impurities? Elemental impurities are traces of metals that can be found in finished drug products. The analysis of elemental impurities is necessary to describe the concentration of the trace elements in final drug products.
Understand more about technologies that provide rapid, efficient qualitative and quantitative analysis Learn how these technologies serve a range of industrial, educational, environmental and health markets Get the help you need to find the answers you seek in your lab or in the field Learn...
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Modern cutting-edge metals are increasingly engineered at the nanoscale to enhance their durability, reliability, and cost. Even traditional processes are now augmented with microscopic inspection to determine the resulting material’s elemental and structural composition.
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Elemental impurities in pharmaceutical formulations can interfere with drug efficacy or have a toxic effect on the patient. Regulators have issued guidelines—such as ICH Q3D, USP 232 and USP 233 Elemental Impurities—for monitoring a range of metal elemental impurities in pharmaceutical materials...
Trace elemental screening and speciation analysis of food is receiving global attention. Some elements are an essential part of a healthy diet, but others, such as lead, mercury, arsenic and cadmium, offer no nutritional benefits to humans and are actually toxic.
Learn More ICP-OES Data Analysis
Inductively coupled plasma optical emission spectroscopy (ICP-OES) data analysis is a multi-step process. First, one must select the correct sample introduction method, as well as which plasma view and configuration to use.
Control of the process steps and wafer environment to meet the daily challenges of routine wafer compliance requires the use of many diverse characterization techniques, including many employing analytical instrumentation.