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Semiconductor circuit edit and circuit prototyping

Accelerating product development and time-to-market are critical as missing a technology window, or falling behind, can be extremely costly. As design and integration complexity rise with each new technology node, circuit edit tools are strategically important for managing costs, avoiding schedule delays, and optimizing product performance and functionality.

With the right tools, workflows and techniques, circuit editing can help companies  reduce mask spins, rapidly prototype, and support customer design in schedules.

Designed specifically for complex semiconductor circuit editing, the Thermo Scientific Centrios and Centrios HX Circuit Edit Systems provide industry leading precision, control, and performance for the semiconductor devices of today and tomorrow.

Centrios HX Circuit Edit System

The Centrios HX Circuit Edit System is designed for the most advanced front and backside edit capabilities with unparalleled editing control, precision, and stability.

Featuring the new Thermo Scientific Celta Focused Ion Beam (FIB) Column, the Centrios HX System delivers high resolution at low beam currents and low landing energies, allowing you to perform edits accurately and with minimum circuit damage. Using an innovative dual-nozzle gas-delivery system with the broadest portfolio of chemistries, and the latest FIB technology, the Centrios HX System enables industry leading high-precision etching and fast, efficient editing.

Centrios Circuit Edit System

The Centrios Circuit Edit System utilizes the field-proven Thermo Scientific Tomahawk WDR Ion Column, providing strong performance and cost of ownership. The Centrios System enables precise front and backside editing, rapid prototyping, and silicon debug and repair for today’s established process nodes.

Key Features

Imaging and milling resolution

Centrios System – High resolution at low beam currents for effective, safe edits using the field-proven Thermo Scientific Tomahawk WDR FIB Column.

Centrios HX System – 25% higher resolution at 4X lower beam currents for effective, safe edits using the new Thermo Scientific Celta FIB Column with the latest beam profile improvements.

Enhanced milling precision and control

Planarity/uniformity, delayering/etch stopping, and high-acuity creation of high-aspect-ratio vias using a simultaneous dual-nozzle gas delivery system and proprietary gas chemistry portfolio.

Dedicated circuit edit platform

Designed specifically for circuit editing, the Centrios and Centrios HX Circuit Edit Systems integrate key components, such as gas chemistry delivery, enabling optimized manual and automated applications.

Low cost of operation

Thermo Scientific NEXS CAD Software for navigation and Thermo Scientific iFAST Software customize automation for improve efficiency and ease of use.


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Specifications

 

Centrios System

Centrios HX System

Ion column

  • Thermo Scientific Tomahawk WDR Ion Column,
    gallium liquid metal, 1000 hour lifetime
  • Thermo Scientific Celta FIB Column

Image resolution

  • 3.5 nm @ 30 kV
  • 2.5nm @ 30 kV

Beam current

  • 1.2 pA – 65 nA
  • 50 nA maximum current

Stage

  • 5-axes motorized eucentric
    • X, Y motion 100 mm
    • Tilt -10° to 60°
    • Rotation 360°
 

End-point detection

  • Simultaneous SE/specimen current
 

Resources

Applications

pathfinding_thumb_274x180_144dpi

Semiconductor Pathfinding and Research

Advanced electron microscopy, focused ion beam, and associated analytical techniques for identifying viable solutions and design methods for the fabrication of high-performance semiconductor devices.

Semiconductor Failure Analysis

Semiconductor Failure Analysis

Increasingly complex semiconductor device structures result in more places for failure-inducing defects to hide. Our next-generation workflows help you localize and characterize subtle electrical issues that affect yield, performance, and reliability.


Techniques

Circuit Edit

Advanced, dedicated circuit edit and nanoprototyping solutions, which combine novel gas-delivery systems with a broad portfolio of chemistries and focused ion beam technology, offer unparalleled control and precision for semiconductor device development.

Learn more ›

Circuit Edit

Advanced, dedicated circuit edit and nanoprototyping solutions, which combine novel gas-delivery systems with a broad portfolio of chemistries and focused ion beam technology, offer unparalleled control and precision for semiconductor device development.

Learn more ›

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Contact us

Electron microscopy services for
semiconductors

To ensure optimal system performance, we provide you access to a world-class network of field service experts, technical support, and certified spare parts.

Learn more ›

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