The Thermo Scientific Meridian 7 system provides visible light laser voltage imaging (LVI) and probing (LVP) and dynamic laser stimulation (DLS/LADA) on sub-10nm devices. By avoiding a requirement for ultra-thin substrates, it preserves the integrity and functionality of the device under test to provide a reliable and practical production solution. It offers a 25 percent optical resolution enhancement over the previous-generation system and has a smaller spot size for better fault localization. In addition, the Meridian 7 offers more certainty in navigation and Design GDS/CAD overlay, less cross-talk and higher waveform signal-to-noise over its predecessor.

The Thermo Scientific Meridian 7 is available in two configurations:

  • Meridian 7D: Combined 1064nm and 785nm dual-SIL laser scanning microscope (LSM) system
  • Meridian 7S: 785nm-only LSM system with optional advanced sample cooling, for high-speed testing where sample thermal management may be necessary to prevent thermal runaway from altering chip performance

Key Features

Dynamic Optical Fault Isolation

Dynamic Optical Fault Isolation for 10nm node and below.

Bandwidth

7 GHz bandwidth for at-speed tests.

Resolution

High resolution visible and Infrared light.

Sample preparation

High-yield sample preparation to 5μm widely available.

Style Sheet for Techniques and Media Gallery Tab
Device frequency mapping with 785nm Laser Voltage Imaging (LVI)
Device frequency mapping with 785nm Laser Voltage Imaging (LVI).
Device frequency mapping with 785nm Laser Voltage Imaging (LVI)
Device frequency mapping with 785nm Laser Voltage Imaging (LVI).

Applications

pathfinding_thumb_274x180_144dpi

Semiconductor Pathfinding and Development

Advanced electron microscopy, focused ion beam, and associated analytical techniques for identifying viable solutions and design methods for the fabrication of high-performance semiconductor devices.

Semiconductor Failure Analysis

Semiconductor Failure Analysis

Increasingly complex semiconductor device structures result in more places for failure-inducing defects to hide. Our next-generation workflows help you localize and characterize subtle electrical issues that affect yield, performance, and reliability.

Optical Fault Isolation

Increasingly complex designs complicate fault and defect isolation in semiconductor manufacturing. Optical fault isolation techniques allow you to analyze the performance of electrically active devices to locate critical defects that cause device failure.

Learn more ›

Optical Fault Isolation

Increasingly complex designs complicate fault and defect isolation in semiconductor manufacturing. Optical fault isolation techniques allow you to analyze the performance of electrically active devices to locate critical defects that cause device failure.

Learn more ›

Contact us

Electron microscopy services for
semiconductors

To ensure optimal system performance, we provide you access to a world-class network of field service experts, technical support, and certified spare parts.

Learn more ›

Style Sheet for Support and Service footer
Style Sheet for Fonts
Style Sheet for Cards