Talos TEM model comparison

  Materials Science Semiconductors Life Sciences
Features Talos F200x Talos F200i Talos F200S Talos F200E Talos F200C Talos L120C
Pole piece X-TWIN X-TWIN   X-TWIN C-TWIN
Gun type X-FEG X-CFEG S-FEG X-FEG X-CFEG S-FEG X-FEG X-FEG LaB6/W
Gun brightness
at 200 kV
[A/cm2/sr]
1.8·10⁹ 2.4·10⁹ 4.0-108 1.8-109 2.4·10⁹ 4.0-108 1.8-109 1.8-109 N/A
EDS type/area

In-column
4SDD Super-X
(120mm²)

Side-entry
30 mm2
Side-entry
100 mm2
Side-entry
Symmetrical
Dual-X
(200 mm2)
In-column
2SDD
Super-X
(60 mm2)
In-column
4SDD Super-X
(120mm²)
Side-entry
Symmetrical
Dual-X (200mm²)
Side-entry
30/100 mm2
EDS net solid
angle [sr]
0.9 0.19 1.28 1.65# 0.45 0.90 1.65 0.18/0.80
Velox absorption
correction for
most accurante
quantification
Yes Yes Yes Yes Yes Yes Yes Yes
Automated/
unattended 3D
EDS
Yes No No Yes No Yes No No
Maps / 
Automated
Particale
Workflow
(S)TEM and EDS (S)TEM and
EDS
(S)TEM and
EDS
(S)TEM and
EDS
(S)TEM and
EDS
(S)TEM and
EDS
Cleanest EDS; 
Fiori P/B 
(on system)
Excellent Great Great Excellent Great Good
HRTEM info 
limit
0.12 0.11 0.12 0.11 0.12 0.12 0.18 N/A
HRTEM line
resolution
0.10 0.10 0.10 0.10 0.10 0.10 0.20
HRSTEM [nm] 0.16

0.14
(with >100 pA)

0.16 0.14
(with >100 pA)
0.16 0.16 0.20 1
Align Genie Yes Yes Yes Yes Yes -
EELS resolution 0.8 eV 0.3 eV 0.8 eV 0.3 eV 0.8 eV 0.8 eV 0.3 eV 0.8 eV ~1.5 eV
CrystalPack
Yes Yes Yes Yes Yes Yes
iDPC Yes Yes Yes Yes Yes Yes
AutoSTEM Yes Yes Yes Yes Yes No
Enclosure Optimized,incl. touch
screen
Optimized, incl. touch screen Compact Optimized,
incl. touch screen
Optimized,
incl. touch screen
Optimized,
incl. touch screen
-
Cryo quality Great Great N/A Excellent
TEM contrast   N/A Excellent
Phase plate No No No No Yes
Semiconductor
standard compliant
Optional N/A Yes N/A
TEM image linear
distortion specification
N/A N/A
Yes
N/A
TEM image linear
variation specification
N/A N/A
Optional
N/A


#=the geometric angle is 2.55

For Research Use Only. Not for use in diagnostic procedures.