Aquilos

Focused Ion Beam (FIB) systems replace the low-mass electrons of the SEM and TEM with high-mass ions in order to mill (or sputter) the specimen’s surface, making it possible to produce minute components or to remove unwanted material. Our FIBs are well suited to a wide range of process control, failure analysis and materials research applications.

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OptiFIB
V400 ACE
V400 ACE

The Thermo Scientific V400ACE Focused Ion Beam (FIB) system is specifically designed to meet the challenges of advanced designs and processes: smaller geometries, higher circuit densities, exotic materials, and complex interconnect structures.

Available for: Semiconductors Research

OptiFIB

The Thermo Scientific OptiFIB Taipan System is a robust focused ion beam circuit edit system optimized for the 10nm process node. Its highest imaging and milling resolution, highest beam placement accuracy, and low system drift combine to result in better success rates and higher productivity. The OptiFIB Taipan System also features a unique portfolio of circuit edit-centric chemistries and software automation for improved usability.

Available for: Semiconductors Research