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Thermo Scientific Chemicals
Tetramethylgermanium, 98%
CAS: 865-52-1 | C4H12Ge | 132.77 g/mol
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Catalog number A16931.14
also known as A16931-14
Price (JPY)
-
Quantity:
25 g
Chemical Identifiers
CAS865-52-1
IUPAC Nametetramethylgermane
Molecular FormulaC4H12Ge
InChI KeyZRLCXMPFXYVHGS-UHFFFAOYSA-N
SMILESC[Ge](C)(C)C
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Specifications
Specification Sheet
Specification SheetAppearance (Color)Clear colorless
Assay (GC)≥97.5%
FormLiquid
Refractive Index1.3870-1.3910 @ 20?C
Employed as a Chemical Vapor Deposition (CVD) precursor to germanium oxide thin films.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Applications
Employed as a Chemical Vapor Deposition (CVD) precursor to germanium oxide thin films.
Solubility
Not miscible or difficult to mix in water.
Notes
Store away from oxidizing agents. Keep the container tightly sealed and store in cool, dry condition in well ventilated place.
Employed as a Chemical Vapor Deposition (CVD) precursor to germanium oxide thin films.
Solubility
Not miscible or difficult to mix in water.
Notes
Store away from oxidizing agents. Keep the container tightly sealed and store in cool, dry condition in well ventilated place.
RUO – Research Use Only
General References:
- M Gazicki.; R Ledzion.; R Mazurczyk.; S Pawłowski. Deposition and properties of germanium/carbon films deposited from tetramethylgermanium in a parallel plate RF discharge.Thin Solid Films.,1998,322(1-2), 123-131.
- Tetsuya Hattori.; Shigeru Semura and Nobuhiro Akasaka. Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition of SiO2 and GeO2?SiO2 Films for Optical Waveguides Using Tetraethylorthosilicate and Tetramethylgermanium.The Japan Society of Applied Physics.,1999,38(5A).