Nickel Chromium, sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)

Used as Magnetron sputtering source. The substrate bias during dc sputtering effectively reduces oxygen contamination in nichrome films. This in turn leads to an enhancement of the preferred orientation of the deposits.

This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.