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Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
Thermo Scientific Chemicals

Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)

CAS: 7439-89-6 | Fe | 55.85 g/mol
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製品番号（カタログ番号）数量
040855.KS1 Ea.
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製品番号（カタログ番号） 040855.KS
価格（JPY）
-
数量:
1 Ea.
一括またはカスタム形式をリクエストする
仕様
定量パーセント注記(metals basis)
CAS7439-89-6
ChEBICHEBI:82664
化学物質名または材質Iron sputtering target
EINECS番号231-096-4
さらに表示
Iron sputtering target is used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

RUO – Research Use Only