GeneArt™ pYES1L Vector with Sapphire™ Technology
Product Image
Invitrogen™

GeneArt™ pYES1L Vector with Sapphire™ Technology

GeneArt™ pYES1LベクターSapphIRe Technology™付きはすぐに使用可能な9.3 Kbの線形化BAC⁄YACシャトルベクターで、GeneArt™高次遺伝子アセンブリシステム(カタログ番号A13285 & A13286)を用いたDNAフラグメントの構築に使用します。ベクターでは詳細を見る
製品番号(カタログ番号)数量
A1328710 Reactions
製品番号(カタログ番号) A13287
価格(JPY)
32,100
キャンペーン価格
Ends: 26-Dec-2025
53,500
割引額 21,400 (40%)
Each
お問い合わせください ›
数量:
10 Reactions
GeneArt™ pYES1LベクターSapphIRe Technology™付きはすぐに使用可能な9.3 Kbの線形化BAC⁄YACシャトルベクターで、GeneArt™高次遺伝子アセンブリシステム(カタログ番号A13285 & A13286)を用いたDNAフラグメントの構築に使用します。ベクターでは、最大110 KbのDNAフラグメントまでクローニングできます。この製品には、線形化GeneArt™ pYES1LベクターSapphIRe Technology™付きが含まれます。

GeneArt™ pYES1LベクターSapphIRe Technology™付きの主な特長と要素:
TRP1によりトリプトファン欠損培地で酵母形質転換体の選択が可能です
• ARS⁄CENオリジンにより酵母内でコンストラクトを安定して維持できます
• F’により結合できます
• oriTにより大腸菌中で大きなコンストラクトを維持できます
• スペクチノマイシン耐性により大腸菌の選択ができます
• クローニング領域に隣接する便利な制限部位が6カ所あります
研究用途にのみご使用ください。診断目的には使用できません。
仕様
抗生物質耐性菌スぺクチノマイシン
クローニング法シームレスクローニング
使用対象(アプリケーション)クローニング
フラグメント数最大10個の断片
製品ラインGeneArt
数量10 Reactions
複製開始点ARS⁄CEN、oriT
サンプルタイプDNA
選択マーカー真核生物TRP1
出荷条件ドライアイス
サイズ合計110 kb(ベクターとすべてのインサート)
ベクターpYES1L線形化
Unit SizeEach
組成および保存条件
製品には、線状のGeneArt™ pYES1LベクターSapphIRe Technology™付き(50 ng⁄ml濃度)のバイアル5本が含まれています。各バイアルには、GeneArt™高次遺伝子アセンブリシステム(別売り)を使用してクローニング反応を2回できるだけのプラスミドが含まれています。

製品は-80℃で保管してください。

このベクターは、適切に保存されている場合、6ケ月間安定していることが保証されます。

よくあるご質問(FAQ)

With the GeneArt High-Order Genetic Assembly System, I'm getting no positive colonies detected by yeast colony PCR. Can you please offer some troubleshooting tips?

We would recommend trying to re-streak the colony on a fresh plate and repeat colony PCR. Do not break open the yeast cells with the beads supplied with the kit; the beads are for transformation into E. coli. Additionally, use less than 0.5 µL of diluted yeast lysate in a 50 µL PCR reaction.

With the GeneArt High-Order Genetic Assembly System, I see small or no yeast colonies after transformation. Can you please offer some suggestions?

Ensure that yeast transformations are incubated at 30 degrees C for 3 days for proper colony formation.

With the GeneArt High-Order Genetic Assembly System, I did not get any yeast colonies after transformation and the transformation control did not work. Can you please offer some suggestions?

Please review the following suggestions:
– Perform transformation exactly as described in protocol.
– Do not freeze-thaw or vortex MaV203 yeast competent cells.
– Use CSM-Trp agar plates for the transformation.
– For best results, use fresh DMSO from an unopened bottle. You may use DMSO stored at -20 degrees C.

I want to use my own E. coli vector for my assembly. Can I do this? How?

Yes, you should be able to adapt your E. coli vector into a yeast-compatible cloning vector using the GeneArt High-Order Vector Conversion Cassette (Cat. No. A13291) for use with the GeneArt High-Order Genetic Assembly System with the following provisions:
– Start by using the DNA Oligo Designer web tool, and verify that your vector and the GeneArt High-Order Vector Conversion Cassette do not share internal homology to prevent potential re-arrangements when using your adapted vector with the GeneArt High-Order Genetic Assembly System.
– Use a vector with a single- or low-copy-number origin for a final construct of >15 kb, if the final plasmid construct will be transferred into E. coli. Usually, low-copy-number E. coli vectors have significantly higher capacity than high-copy number vectors.
– Avoid chloramphenicol selection markers on the custom vector since this is the marker on the cassette.
– After ligation (1:10 vector: insert ratio recommended), transform competent E. coli cells with the ligation mixture and plate on double selection LB plates (chloramphenicol plus the antibiotic marker on your custom vector backbone).To linearize your yeast-adapted cloning vector for multi-fragment assembly, a double-digestion is required to avoid background caused by residual palindromic end sequences resulting from a single enzyme digestion.

With the GeneArt High-Order Genetic Assembly System, what are the requirements for stitching oligonucleotides used for insertion editing versus deletion editing?

Stitching oligonucleotides used for insertion editing must have a 30-nucleotide overlap with each adjacent fragment in addition to the insertion bases (for a total length of up to 80-mer, including up to 20 insertion bases). See manual for diagram. Note: This applies for a 2-fragment assembly and the insertion applies only to the internal junction. Use a 40-bp overlap (i.e., an 80-mer oligonucleotide) for the remaining seamless junctions.


Stitching oligonucleotides used for deletion editing must have a 40-nucleotide overlap with each adjacent fragment, annealing up to 6 nucleotides from the junction into each fragment, thus leaving up to 6 bp at the end of each fragment to be deleted during transformation-associated recombination. See manual for diagram. Note: This applies for a 2-fragment assembly and the deletion applies only to the internal junction. Use a 40-bp overlap (i.e., an 80-mer oligonucleotide) for the remaining seamless junctions.