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Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
Thermo Scientific Chemicals

Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)

CAS: 7439-89-6 | Fe | 55.85 g/mol
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Catalog NumberQuantity
040855.KS1 Ea.
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Catalog number 040855.KS
Price (USD)
382.65
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Online exclusive
Ends: 30-Jun-2026
450.00
Save 67.35 (15%)
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Quantity:
1 Ea.
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Price (USD)
382.65
Special offer
Online exclusive
Ends: 30-Jun-2026
450.00
Save 67.35 (15%)
Each
Specifications
Assay Percent Notes(metals basis)
CAS7439-89-6
ChEBICHEBI:82664
Chemical Name or MaterialIron sputtering target
EINECS Number231-096-4
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Iron sputtering target is used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

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