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Are you ready to delve into the advanced capabilities of X-ray Photoelectron Spectroscopy (XPS) for surface analysis? Join us for an exclusive webinar where Robin Simpson, application scientist from Thermo Fisher Scientific, will guide you through the revolutionary features and applications of the Thermo Scientific™ K-Alpha™ XPS System.
Since its launch, the K-Alpha has transformed XPS from a complex, specialist technique into a routine tool for material analysis. In this webinar, you will discover how this powerful system can address your critical surface and interfacial chemistry questions by offering high throughput, ease of use, and exceptional performance.
What you will learn:
- Introduction to the K-Alpha XPS System: Discover the unique features that make the K-Alpha a game-changer in surface analysis.
- High-performance capabilities: Learn about the high-performance X-ray source, spectrometer, dual beam charge compensation system, and monatomic argon ion beam for depth profiling.
- Case studies and applications: Explore real-world examples and case studies showcasing the K-Alpha's versatility in various material science applications.
- User-friendly operation: Understand how the Avantage data system simplifies the analysis process, making it accessible for routine use.
Don't miss this opportunity to enhance your knowledge and expertise in surface analysis with the K-Alpha XPS System. Fill out the registration form to gain exclusive access to this informative webinar.
About the speaker
Robin Simpson, Application Scientist, Thermo Fisher Scientific
Robin Simpson is one of the application scientists in the surface analysis team at Thermo Fisher Scientific. In this role, Robin is involved in system demonstrations, customer training, and the production of marketing content for the surface analysis products. He had close links to the team for four years while undertaking his engineering doctorate at the University of Surrey and he officially joined the team in 2017. His thesis involved the investigation of the effects of Ar cluster depth profiling on varied material surfaces using the MAGCIS ion source.