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Semiconductor Filtration and Gas Control Solutions

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Controlling contamination across semiconductor manufacturing

Fluids used in semiconductor manufacturing may require rigorous control of particulates, gels, dissolved gases, and trace metal ions across the entire fabrication flow from incoming water treatment and ultrapure water (UPW) generation to high-purity chemical delivery, chemical mechanical planarization (CMP) slurry management, and point-of-use filtration. Even sub-ppb contaminants at the wafer surface can induce defects. As device geometries shrink toward sub-5 nm nodes, particulate count, metal ion concentrations, and dissolved gas levels that were acceptable at earlier nodes can become defect-generating. The wide range of process fluids often requires filtration technologies to address chemical compatibility, extractables and leachables, and contaminant retention.

Semiconductor filtration solutions by process application

Learn about our liquid filtration solutions for semiconductors and dissolved gas control, as listed below by process application.

Ultrapure water

UPW may be used to remove defect-causing contaminants from wafer surfaces and rinse components after chemical exposure. The UPW production train often requires filtration across multiple stages: pre-UF/MF and pre-RO bulk, IX resin traps, polishing IX, pre-UF, and final POU UF at the tool.

High purity chemicals

Photoresists, BARC, anti‑reflective layers, and other specialty chemicals used in lithography, etch, and cleaning processes often require nanoparticle removal, gel reduction, and metal ion reduction. These contaminants, including metal contamination originating from raw materials, plumbing systems, or environmental exposure, can negatively impact process performance and device reliability.

Chemical mechanical planarization

Oversized particles can cause wafer surface defects, leading to reduced yield and increased inspection costs. Filtration may be applied at multiple points, including the blending station, day tank, distribution loop, and CMP tool point of use (POU). Different types of depth and membrane filtration can be used to address these challenges while ensuring chemical compatibility with both high‑ and low‑pH slurries.

Other microelectronics applications

Adjacent microelectronics applications served by the portfolio include silicon wafers, flat panel displays, printed wire boards, and lithium-ion batteries. Requirements across these applications may share common themes, such as particle control and dissolved gas management.

Filtration capabilities across semiconductor production

Semiconductor manufacturing often requires consistent contamination control across three technical capability areas: particle and nanoparticle removal, dissolved gas control, and metal ion reduction.

Particle and nanoparticle removal

Contamination profiles vary by process step, and the filtration technology is matched accordingly. Pre-RO bulk particulates can be addressed by high-flow filters with high contaminant loading capacity. UPW fine particles and nanoparticles may be addressed by charge-modified nylon membrane filters and PES-based filters. Nanoparticles and gels in high-purity chemicals are addressed by hollow fiber nanoparticle filters. CMP slurry large particle counts (LPCs) are controlled by absolute-rated filters and polypropylene media suited to high and low pH compatibility. Controlling particle count and size at each step may be linked to wafer yield and defect rates.

Dissolved gas control

Dissolved gas control in UPW can be managed using hollow fiber membrane contactor technology. Dissolved O₂ can cause corrosion, affect conductivity, and introduce process variability; free CO₂ prior to the anion exchange bed may increase regeneration frequency and chemical costs. Hollow fiber membrane contactor technology offers a chemical-free, compact approach to ultra-low dissolved gas levels suited to integration into existing UPW infrastructure.

Liqui-Cel EXF Membrane Contactors can help with dissolved O₂ and CO₂ removal in UPW applications.

Metal ion reduction

Ion exchange-based metal ion reduction may be critical for high-purity chemical applications in semiconductor manufacturing. Trace metal contaminants in photoresists and other process chemicals, even at sub-ppb concentrations, can impact lithographic performance, cause parametric shifts, and compromise device reliability. Achieving metal levels in the low-ppb to low-ppt range requires advanced ion exchange media that combine high selectivity for target metal ions, broad chemical compatibility, and ultra-low extractables.

Metal Ion Purifier can help meet these requirements across a wide range of high-purity chemicals and fluid viscosities.

Filtration products for semiconductor manufacturing

The industrial filtration portfolio includes products to help address particle filtration, nanoparticle removal, metal ion reduction, and dissolved gas control requirements encountered in semiconductor and microelectronics manufacturing.

NanoSHIELD Hollow Fiber Filters

NanoSHIELD Hollow Fiber Filters are a hollow fiber nanoparticle filtration platform for gel reduction and nanoparticle removal in high-purity chemical manufacturing. Designed for the final filtration of photoresists and specialty chemicals.

Betapure AU/AUL Filters

Betapure AU Filters may offer consistent effluent quality. Betapure AUL Filters may address critical CMP applications. A rigid structure maintains retention performance under increasing differential pressure in recirculating slurry loops.

Liqui-Cel EXF Membrane Contactors

Hollow fiber membrane contactor platforms, such as Liqui-Cel EXF Membrane Contactors, can help control dissolved gases in UPW. Dissolved O₂ removal is designed to help protect product yields. CO₂ removal may improve EDI efficiency and reduce anion exchange bed regeneration.

Metal Ion Purifiers

Designed for sub-50 ppt metal removal in photoresists, etchants, and high-purity chemicals, the Metal Ion Purifier Cartridges can reduce metal ions in high-purity resins and solvents. Available in SCP and APP media types.

Product links on this page currently direct to Solventum.com. Product information will soon be available on Thermofisher.com as part of our ongoing integration.

Frequently asked questions

Semiconductor liquid filtration is a set of process-specific liquid purification disciplines used throughout semiconductor fabrication, distinct from general industrial filtration in its tolerance for contamination. The principal disciplines are particle and nanoparticle removal from UPW, high-purity chemicals, and CMP slurries. Residual contamination at the wafer surface translates directly to device defects and yield loss.

Key filtration technologies and their primary process applications include:

  • High-flow filters for pre-RO bulk water
  • Charge-modified nylon membrane filters for UPW fine particle control
  • Hollow fiber nanoparticle filters for high-purity chemical final filtration
  • Absolute-rated filters for CMP slurry LPC reduction
  • Ion exchange cartridges for metal ion reduction in high-purity chemicals
  • Hollow fiber membrane contactors for UPW dissolved gas control

UPW rinses wafer surfaces and cleans components after chemical exposure throughout semiconductor manufacturing. Residual particles, metal ions, TOC, bacteria, or dissolved gases that reach the wafer surface can introduce defects that affect device performance and yield. UPW quality requirements tighten as technology nodes advance, and multi-stage filtration combined with dissolved gas control is required throughout UPW production and distribution to maintain specification.

CMP filtration may control LCPs in slurry. Oversized particles cause micro-scratches and surface defects that reduce yield and increase rework costs. Filtration applied at the blending station, day tank, distribution loop, and CMP tool POU helps maintain the slurry particle-size distribution within specification. For application-specific guidance on CMP slurry filtration, connect with a Thermo Fisher Scientific specialist.

Discover filtration and separation resources

Process engineers, design engineers, and quality managers can access application-specific resources, including brochures, technical data sheets, and case studies. Browse resources by industry to support informed selection and process planning.

Enhance semiconductor quality, efficiency, and sustainability

Intended use of the products mentioned on this page vary. For specific intended use statements, please refer to the Instructions for Use for the product.