iCAP PRO Series ICP-OES systems
Robust ICP-OES Systems
Our robust ICP-OES systems offer easy-to-use software and multi-element detection technology far superior to that of single-element AAS and multi-element microwave plasma techniques. They are ideal for laboratories with low sample throughput requirements and users new to the technique or who require a simple solution for multi-elemental analysis.
Advanced, High-Throughput ICP-OES Systems
Analyze high-matrix trace elemental samples with sensitive multi-element detection and meet your data requirements. These instruments include both the iFR analysis mode, which measures the entire wavelength range in one measurement, and a eUV analysis mode, which measures the UV region of the spectrum with greater sensitivity.
ICP-OES instrument comparison
| iCAP PRO ICP-OES | iCAP PRO X ICP-OES | iCAP PRO XP ICP-OES | iCAP PRO XPS ICP-OES | ||
|---|---|---|---|---|---|
| Plasma view | Vertical Radial or Vertical Duo | ||||
| Start up time | 1 hour (from off) | 15 minutes (from standby) | 5 minutes (from standby) | ||
| Wavelength range | iFR mode 167.021 nm - 852.145 nm | iFR mode 167.021 nm - 852.145 nm eUV mode 167.021 nm - 240.063 nm | |||
| Resolution @ 200nm | 7 pm | ||||
| Measurement modes | iFR | iFR and eUV | |||
| Camera technology | CID821 | ||||
| Full spectrum capture | Yes | ||||
| RF source radial | 1150 W | 750, 1150 or 1350 W | 750 to 1600 W | ||
| RF source duo | 1150 W | 750, 1150 or 1350 W | 750 to 1600 W | ||
| Gas flow controls | Optimized MFC | Variable MFC | |||
| Plasma gas | Fixed at 12.5 L/min | Fixed, optimized at 8.5, 12.5 or 14.5 L/min | 0 to 20 L/min | ||
| Auxiliary gas | Fixed at 0.5 L/min | Selectable 0.5, 1 or 1.5 L/min | 0 to 2 L/min | ||
| Nebulizer gas | 0.3 to 0.8 L/min | 0 to 1.5 L/min | 0.0 to 1.5 L/min | ||
| Additional gas | — | 0 - 0.25 L/min | |||
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Style Sheet for Global Design System
