Superior detection

These ICP-OES systems incorporate easy-to-use software and multi-element detection technology far superior to that of single-element AAS and multi-element microwave plasma techniques.

Ease of use

Several optimized settings are defined as standard, making these instruments ideal for users new to the technique or those who require a simple solution for multi-elemental analysis.


The new vertical torch design ensures high-matrix robustness for a range of sample types and the intelligent Full Range (iFR) analysis mode measures the entire wavelength range in one measurement, simplifying method development and analysis without compromising sensitivity or accuracy.

Plasma viewVertical Radial or Vertical Duo
Start-up time1 hour (from off)15 minutes (from standby)
Wavelength rangeiFR mode 167.021 nm - 852.145 nm with full spectrum capture
Resolution at 200 nm7 pm
RF source radial and duo1150 W750, 1150 or 1350 W
Gas flow controlsOptimized MFC
Plasma gasFixed at 12.5 L/minFixed, optimized at 8.5, 12.5 or 14.5 L/min
Auxiliary gasFixed at 0.5 L/minSelectable 0.5, 1 or 1.5 L/min
Nebulizer gas0.3 to 0.8 L/min0 to 1.5 L/min


iCAP PRO Series ICP-OES Product Tour
iCAP PRO Series ICP-OES System product tour

Are you curious to see what our iCAP PRO Series ICP-OES Systems look like close up? We've designed a 3D product tour to help you explore these systems in a self-guided manner. Embedded in each tour are videos, literature, and detailed descriptions of key features and capabilities.

View product tour › 

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Style Sheet for Global Design System
CMD Wide-format style fixes